Effect of plate thickness on particle deposition velocity onto a face-up flat plate situated parallel to an airflow
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Sang-Chul | - |
dc.contributor.author | Kim, Won-Geun | - |
dc.contributor.author | Yook, Se-Jin | - |
dc.date.accessioned | 2022-07-16T19:14:31Z | - |
dc.date.available | 2022-07-16T19:14:31Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2011-09 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/167700 | - |
dc.description.abstract | The effect of plate thickness on particle deposition velocity onto a face-up flat plate in a parallel airflow was examined both numerically and experimentally. Plate thickness was varied as 0.05, 0.925, 2.3, and 6.35 mm, by considering flat plates of negligible thickness, 450 mm wafers, 5 in photomasks, and 6 in EUVL photomasks, respectively. Statistical Lagrangian particle tracking (SLPT) model with the use of commercial codes was employed. The SLPT model was validated by comparing the numerically obtained particle deposition velocities with either the theoretically predicted or the experimentally determined particle deposition velocities, for the flat plates of various thicknesses. Then, the effect of plate thickness on particle deposition velocity onto the face-up flat plate in a parallel airflow was investigated by employing the SLPT model. It was found that the effect of plate thickness should be taken into account, when the particle deposition velocity onto a 5 in photomask (2.3 mm thick) or a 6 in EUVL photomask (6.35 mm thick) was considered. However, it was anticipated that the effect of plate thickness was insignificant, when the particle deposition velocity onto a 450 mm wafer was taken into consideration. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Effect of plate thickness on particle deposition velocity onto a face-up flat plate situated parallel to an airflow | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Yook, Se-Jin | - |
dc.identifier.doi | 10.1063/1.3639299 | - |
dc.identifier.scopusid | 2-s2.0-80053555517 | - |
dc.identifier.wosid | 000295619300038 | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.110, no.6, pp.1 - 8 | - |
dc.relation.isPartOf | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 110 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | HORIZONTAL AEROSOL FLOW | - |
dc.subject.keywordPlus | PROTECTION SCHEMES | - |
dc.subject.keywordPlus | SEMICONDUCTOR WAFERS | - |
dc.subject.keywordPlus | CARRIER SYSTEMS | - |
dc.subject.keywordPlus | EUVL MASKS | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordPlus | SIZES | - |
dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.3639299 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.