Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates
DC Field | Value | Language |
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dc.contributor.author | Oh, Dohyun | - |
dc.contributor.author | No, Young Soo | - |
dc.contributor.author | Kim, Su Youn | - |
dc.contributor.author | Cho, Woon Jo | - |
dc.contributor.author | Kwack, Kae Dal | - |
dc.contributor.author | Kim, Tae Whan | - |
dc.date.accessioned | 2022-07-16T21:52:38Z | - |
dc.date.available | 2022-07-16T21:52:38Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2011-02 | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/169130 | - |
dc.description.abstract | Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40 nm-CuAlO2/18 nm-Ag/40 nm-CuAlO2 multilayer films was 2.8 x 10(-5) Omega cm, and the transmittance of the multilayer films with an Ag film thickness of 8 nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Tae Whan | - |
dc.identifier.doi | 10.1016/j.jallcom.2010.10.180 | - |
dc.identifier.scopusid | 2-s2.0-78651353930 | - |
dc.identifier.wosid | 000287167700158 | - |
dc.identifier.bibliographicCitation | JOURNAL OF ALLOYS AND COMPOUNDS, v.509, no.5, pp.2176 - 2179 | - |
dc.relation.isPartOf | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.citation.title | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.citation.volume | 509 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 2176 | - |
dc.citation.endPage | 2179 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.subject.keywordPlus | PULSED-LASER DEPOSITION | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | TRANSPARENT | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | COATINGS | - |
dc.subject.keywordPlus | DIODE | - |
dc.subject.keywordAuthor | Oxide materials | - |
dc.subject.keywordAuthor | Thin films | - |
dc.subject.keywordAuthor | Electronic properties | - |
dc.subject.keywordAuthor | Optical properties | - |
dc.subject.keywordAuthor | Atomic force microscopy | - |
dc.subject.keywordAuthor | AFM | - |
dc.subject.keywordAuthor | X-ray diffraction | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0925838810027106?via%3Dihub | - |
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