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Experimental Decomposition of the Positive Gate-bias Temperature Stress-induced Instability and Its Modeling in InGaZnO Thin-film Transistors

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dc.contributor.author오새룬터-
dc.date.accessioned2022-08-09T02:08:41Z-
dc.date.available2022-08-09T02:08:41Z-
dc.date.issued20170830-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/170675-
dc.titleExperimental Decomposition of the Positive Gate-bias Temperature Stress-induced Instability and Its Modeling in InGaZnO Thin-film Transistors-
dc.typeConference-
dc.citation.conferenceNameInternational Meeting on Information Display (IMID)-
dc.citation.conferencePlaceBEXCO, Busan, Korea-
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OH, SAE ROON TER
ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)
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