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GaAs photovoltaics and optoelectronics using releasable multilayer epitaxial assemblies

Authors
Yoon, JongseungJo, SungjinChun, Ik SuJung, InhwaKim, Hoon-SikMeitl, MatthewMenard, EtienneLi, XiulingColeman, James J.Paik, UngyuRogers, John A.
Issue Date
May-2010
Publisher
NATURE PUBLISHING GROUP
Citation
NATURE, v.465, no.7296, pp.329 - U80
Indexed
SCIE
SCOPUS
Journal Title
NATURE
Volume
465
Number
7296
Start Page
329
End Page
U80
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/175063
DOI
10.1038/nature09054
ISSN
0028-0836
Abstract
Compound semiconductors like gallium arsenide (GaAs) provide advantages over silicon for many applications, owing to their direct bandgaps and high electron mobilities. Examples range from efficient photovoltaic devices(1,2) to radio-frequency electronics(3,4) and most forms of optoelectronics(5,6). However, growing large, high quality wafers of these materials, and intimately integrating them on silicon or amorphous substrates (such as glass or plastic) is expensive, which restricts their use. Here we describe materials and fabrication concepts that address many of these challenges, through the use of films of GaAs or AlGaAs grown in thick, multilayer epitaxial assemblies, then separated from each other and distributed on foreign substrates by printing. This method yields large quantities of high quality semiconductor material capable of device integration in large area formats, in a manner that also allows the wafer to be reused for additional growths. We demonstrate some capabilities of this approach with three different applications: GaAs-based metal semiconductor field effect transistors and logic gates on plates of glass, near-infrared imaging devices on wafers of silicon, and photovoltaic modules on sheets of plastic. These results illustrate the implementation of compound semiconductors such as GaAs in applications whose cost structures, formats, area coverages or modes of use are incompatible with conventional growth or integration strategies.
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