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The fabrication and characterization of organic light-emitting diodes using transparent single-crystal Si membranes
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Su-Hwan | - |
| dc.contributor.author | Kim, Dal-Ho | - |
| dc.contributor.author | Kim, Ji-Heon | - |
| dc.contributor.author | Takeo, Katoh | - |
| dc.contributor.author | Lee, Gon-Sub | - |
| dc.contributor.author | Park, Jea-Gun | - |
| dc.date.accessioned | 2022-12-20T20:21:23Z | - |
| dc.date.available | 2022-12-20T20:21:23Z | - |
| dc.date.issued | 2009-11 | - |
| dc.identifier.issn | 0957-4484 | - |
| dc.identifier.issn | 1361-6528 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/175967 | - |
| dc.description.abstract | For applications such as solar cells and displays, transparent single-crystal Si membranes were fabricated on a silicon-on-insulator (SOI) wafer. The SOI wafer included a buried layer of SiO2 and Si3N4 as an etch-stop layer. The etch-stop layer enabled fabrication of transparent single-crystal Si membranes with various thicknesses, and the thinning technology is described. For membranes with thicknesses of 18, 72 and 5000 nm, the respective optical transparent were 96.9%, 93.7% and 9% for R (red, lambda = 660 nm), 96.9%, 91.4% and 1% for G (green, lambda = 525 nm), and 97.0%, 93.2% and 0% for B (blue, lambda = 470 nm). Organic light-emitting diodes (OLEDs) were then fabricated on transparent single-crystal Si membranes with various top Si thicknesses. OLEDs fabricated on 18, 72 and 5000 nm thick membranes and operated at 6 V demonstrated a luminance of 1350, 443 and 27 cd m(-2) at the current densities of 148, 131 and 1.5 mA cm(-2), respectively. | - |
| dc.format.extent | 8 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Physics Publishing | - |
| dc.title | The fabrication and characterization of organic light-emitting diodes using transparent single-crystal Si membranes | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.1088/0957-4484/20/45/455202 | - |
| dc.identifier.scopusid | 2-s2.0-70350645169 | - |
| dc.identifier.wosid | 000270904600008 | - |
| dc.identifier.bibliographicCitation | Nanotechnology, v.20, no.45, pp 1 - 8 | - |
| dc.citation.title | Nanotechnology | - |
| dc.citation.volume | 20 | - |
| dc.citation.number | 45 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 8 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | SILICON | - |
| dc.subject.keywordPlus | IMPLANTATION | - |
| dc.subject.keywordPlus | NITRIDE | - |
| dc.subject.keywordPlus | STRESS | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.1088/0957-4484/20/45/455202 | - |
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