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Hierarchical Nanostructure Produced by Growing Carbon Nanotubes on Silicon Oxide Nanowires
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Woo, Hee J. | - |
| dc.contributor.author | Kim, Jung H. | - |
| dc.contributor.author | Ahnn, Hyung S. | - |
| dc.contributor.author | Yoon, Chong S. | - |
| dc.date.accessioned | 2022-12-20T20:32:39Z | - |
| dc.date.available | 2022-12-20T20:32:39Z | - |
| dc.date.issued | 2009-10 | - |
| dc.identifier.issn | 1099-0062 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176061 | - |
| dc.description.abstract | Carbon nanotubes (CNTs) were grown using plasma-enhanced chemical vapor deposition on silicon oxide nanowires (SiO(x)NWs) to construct one-dimensional hierarchical heterostructures. To grow the CNTs on the SiO(x)NWs, the nanowire surface was decorated with Ni seed particles by direct physical deposition. The nanosized Ni seed particles allowed the CNTs to nucleate on the nanowire surface. Scanning-and transmission electron microscopy verified that branches of CNTs project from the SiO(x)NWs throughout the entire length of the individual SiO(x)NWs. The initial Ni seed size can be used as one of the process parameters to control the CNT length and density on the nanowire surface. (C) 2009 The Electrochemical Society. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Electrochemical Society, Inc. | - |
| dc.title | Hierarchical Nanostructure Produced by Growing Carbon Nanotubes on Silicon Oxide Nanowires | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1149/1.3236799 | - |
| dc.identifier.scopusid | 2-s2.0-70350059456 | - |
| dc.identifier.wosid | 000270915300030 | - |
| dc.identifier.bibliographicCitation | Electrochemical and Solid-State Letters, v.12, no.12, pp K67 - K70 | - |
| dc.citation.title | Electrochemical and Solid-State Letters | - |
| dc.citation.volume | 12 | - |
| dc.citation.number | 12 | - |
| dc.citation.startPage | K67 | - |
| dc.citation.endPage | K70 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Electrochemistry | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
| dc.subject.keywordPlus | CORE-SHELL | - |
| dc.subject.keywordPlus | GROWTH | - |
| dc.subject.keywordPlus | PLASMA | - |
| dc.subject.keywordPlus | HETEROSTRUCTURES | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.1149/1.3236799 | - |
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