(111) Faceted Ceria and Its Influence on STI CMP for Memory Devices Below 50 nm
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Ye-Hwan | - |
dc.contributor.author | Kim, Jong-Woo | - |
dc.contributor.author | Watanabe, Akira | - |
dc.contributor.author | Naito, Makio | - |
dc.contributor.author | Paik, Ungyu | - |
dc.date.accessioned | 2022-12-20T20:32:44Z | - |
dc.date.available | 2022-12-20T20:32:44Z | - |
dc.date.created | 2022-08-26 | - |
dc.date.issued | 2009-10 | - |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176062 | - |
dc.description.abstract | We investigated the effects of (111) faceted ceria nanoparticles on the removal rate of oxide films in shallow trench isolation (STI) chemical mechanical planarization (CMP). The X-ray diffraction peak ratio of (111) to (200) for the (111) faceted ceria particles synthesized by a flash-creation method was 4.08, while the ratio for polyhedral ceria synthesized by a solid-state displacement reaction was 2.65. The highest surface density of atoms in the (111) plane led to an increase in removal rates. Faceted ceria slurry yielded a higher oxide removal rate and greater selectivity than the polyhedral ceria slurry in STI CMP evaluation. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.title | (111) Faceted Ceria and Its Influence on STI CMP for Memory Devices Below 50 nm | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Paik, Ungyu | - |
dc.identifier.doi | 10.1149/1.3236801 | - |
dc.identifier.scopusid | 2-s2.0-70350077816 | - |
dc.identifier.wosid | 000270915300025 | - |
dc.identifier.bibliographicCitation | ELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.12, pp.H449 - H452 | - |
dc.relation.isPartOf | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.title | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.citation.volume | 12 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | H449 | - |
dc.citation.endPage | H452 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | NON-PRESTONIAN BEHAVIOR | - |
dc.subject.keywordPlus | HYDROTHERMAL SYNTHESIS | - |
dc.subject.keywordPlus | OXIDE POWDERS | - |
dc.subject.keywordPlus | SLURRY | - |
dc.subject.keywordPlus | NANOTOPOGRAPHY | - |
dc.subject.keywordPlus | SURFACTANT | - |
dc.subject.keywordPlus | PARTICLES | - |
dc.subject.keywordPlus | IMPACT | - |
dc.subject.keywordPlus | SIZE | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1149/1.3236801 | - |
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