Cell characteristics of a multiple alloy nano-dots memory structure
DC Field | Value | Language |
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dc.contributor.author | Bea, Ji Chel | - |
dc.contributor.author | Song, Yun Heub | - |
dc.contributor.author | Lee, Kang-Wook | - |
dc.contributor.author | Lee, Gae-Hun | - |
dc.contributor.author | Tanaka, Tetsu | - |
dc.contributor.author | Koyanagi, Mitsumasa | - |
dc.date.accessioned | 2022-12-20T21:29:07Z | - |
dc.date.available | 2022-12-20T21:29:07Z | - |
dc.date.created | 2022-08-26 | - |
dc.date.issued | 2009-08 | - |
dc.identifier.issn | 0268-1242 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176442 | - |
dc.description.abstract | A multiple alloy metal nano-dots memory using FN tunneling was investigated in order to confirm its structural possibility for future flash memory. In this work, a multiple FePt nano-dots device with a high work function (similar to 5.2 eV) and extremely high dot density (similar to 1.2 x 10(13) cm(-2)) was fabricated. Its structural effect for multiple layers was evaluated and compared to the one with a single layer in terms of the cell characteristics and reliability. We confirm that MOS capacitor structures with two to four multiple FePt nano-dot layers provide a larger threshold voltage window and better retention characteristics. Furthermore, it was also revealed that several process parameters for block oxide and inter-tunnel oxide between the nano-dot layers are very important to improve the efficiency of electron injection into multiple nano-dots. From these results, it is expected that a multiple FePt nano-dots memory using Fowler-Nordheim (FN) tunneling could be a candidate structure for future flash memory. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Cell characteristics of a multiple alloy nano-dots memory structure | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Song, Yun Heub | - |
dc.identifier.doi | 10.1088/0268-1242/24/8/085013 | - |
dc.identifier.scopusid | 2-s2.0-68949116224 | - |
dc.identifier.wosid | 000268301000013 | - |
dc.identifier.bibliographicCitation | SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.24, no.8, pp.1 - 5 | - |
dc.relation.isPartOf | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | - |
dc.citation.title | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | - |
dc.citation.volume | 24 | - |
dc.citation.number | 8 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 5 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | ELECTRICAL CHARACTERIZATION | - |
dc.subject.keywordPlus | NONVOLATILE MEMORY | - |
dc.subject.keywordPlus | DEVICES | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1088/0268-1242/24/8/085013 | - |
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