Characteristics of plasma hydrogenated ZnO films oriented along the (11-20) plane grown by pulsed laser deposition
- Authors
- Song, Hooyoung; Kim, Jae-Hoon; Kim, Eun Kyu; Hwang, Sung-Min
- Issue Date
- May-2009
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Non-polar ZnO; Hydrogen plasma irradiation; Surface morphology; Catodoluminescence
- Citation
- THIN SOLID FILMS, v.517, no.14, pp.3927 - 3930
- Indexed
- SCIE
SCOPUS
- Journal Title
- THIN SOLID FILMS
- Volume
- 517
- Number
- 14
- Start Page
- 3927
- End Page
- 3930
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176884
- DOI
- 10.1016/j.tsf.2009.01.131
- ISSN
- 0040-6090
- Abstract
- Single crystalline phase ZnO layers oriented along the (11-20) plane were successfully grown on (1-102) sapphire substrate by using a modified two-step pulsed laser deposition process. The full width at half maximum of rocking curve for (11-20) ZnO was 430 arc sec. After a hydrogen plasma treatment the value of, surface roughness was decreased from 37.5 to 10.2 nm. And the intensity of ultra-violet emission at 380 nm in cathodoluminescence (CL) spectrum was greatly increased by the hydrogen plasma irradiation. In the time-resolved photoluminescence (TRPL) spectra, the minimum value of decay time was 36 ps after the hydrogen plasma irradiation for 5 min. Especially, CL and TRPL results show the potential of high efficient optoelectronic devices by using the hydrogen plasma treatment.
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