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Improving Read Disturb Characteristics by Self-Boosting Read Scheme for Multilevel NAND Flash Memories

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dc.contributor.authorKang, Myounggon-
dc.contributor.authorPark, Ki-Tae-
dc.contributor.authorSong, Youngsun-
dc.contributor.authorHwang, Soonwook-
dc.contributor.authorChoi, Byung Yong-
dc.contributor.authorSong, Yunheub-
dc.contributor.authorLee, Yeong-Taek-
dc.contributor.authorKim, Changhyun-
dc.date.accessioned2022-12-20T22:46:35Z-
dc.date.available2022-12-20T22:46:35Z-
dc.date.issued2009-04-
dc.identifier.issn0021-4922-
dc.identifier.issn1347-4065-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177006-
dc.description.abstractA new NAND string and its read operation scheme using self-boosting as a solution for improving read disturb characteristics of NAND flash memories are proposed. By using the proposed self-boosting read scheme, which includes an optimized bias voltage and adjusted threshold voltage (V-th) of dummy cells, the self-boosted channel voltage prevents soft-programming in unselected memory cells during read operation due to reduced electric field across tunnel oxide. Compared to the conventional scheme this leads to a significant improvement in read disturb characteristics. From simulation and measurement results, the worst electric field of the proposed NAND flash memory during read operation is decreased by around 50% and V-th shifts caused by read disturb is lowered by around 40%, compared to conventional NAND. The proposed NAND was fabricated in a 60 nm NAND technology and successfully demonstrated.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherIOP Publishing Ltd-
dc.titleImproving Read Disturb Characteristics by Self-Boosting Read Scheme for Multilevel NAND Flash Memories-
dc.typeArticle-
dc.publisher.location영국-
dc.identifier.doi10.1143/JJAP.48.04C062-
dc.identifier.scopusid2-s2.0-77952539140-
dc.identifier.wosid000265652700063-
dc.identifier.bibliographicCitationJapanese Journal of Applied Physics, v.48, no.4, pp 1 - 6-
dc.citation.titleJapanese Journal of Applied Physics-
dc.citation.volume48-
dc.citation.number4-
dc.citation.startPage1-
dc.citation.endPage6-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusDynamic random access storage-
dc.subject.keywordPlusElectric fields-
dc.subject.keywordPlusNAND circuits-
dc.subject.keywordPlusFlash memory-
dc.subject.keywordPlusConventional schemes-
dc.subject.keywordPlusDummy cells-
dc.subject.keywordPlusMemory cell-
dc.subject.keywordPlusNAND flash memory-
dc.subject.keywordPlusRead disturb-
dc.subject.keywordPlusRead operation-
dc.subject.keywordPlusSimulation and measurement-
dc.subject.keywordPlusTunnel oxide-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1143/JJAP.48.04C0620-
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