Incorporation of carbon nanotube into direct-patternable ZnO thin film formed by photochemical solution deposition

Abstract

Direct-patterning of ZnO hybrid films containing MWNT was realized without using photoresist and dry etching. Photosensitive 2-nitrobenzaldehyde was introduced into the solution precursors as a stabilizer and contributed to form a cross-linked network structure during photochemical reaction. According to the incorporation of multi-walled nanotube (MWNT) into ZnO films, the transmittance of ZnO hybrid film containing MWNT did not change but the sheet resistance was improved due to the enhancement of charge mobility due to pi-bonding nature of MWNT. These results suggested a possibility that a micro-patterned system can be fabricated relatively easily and without high-cost processes, for example, by conventional etching procedure.