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First-principles study of thermal and electron-activated dissociation of acetone on Si(001)

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dc.contributor.authorLee, Jun-Ho-
dc.contributor.authorLee, Ji Young-
dc.contributor.authorCho, Jun-Hyung-
dc.date.accessioned2022-12-21T00:35:19Z-
dc.date.available2022-12-21T00:35:19Z-
dc.date.created2022-08-26-
dc.date.issued2008-11-
dc.identifier.issn0021-9606-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177755-
dc.description.abstractUsing first-principles density-functional calculations, we investigate the reaction of acetone on the Si(001) surface, which exhibits the conversion from a kinetically controlled reaction to thermodynamically controlled one by means of thermal anneal or the highly confined electron beam of the scanning tunneling microscopy (STM) tip. We identified the four different reaction pathways forming not only two kinds of di-sigma structures on top of a single Si dimer (termed as the [2+2] cycloaddition structure) and across the ends of two adjacent Si dimers but also two bridge-bonded dissociative structures (termed the "end-bridge" and "dimer-bridge" structures) involving two adjacent Si dimers. Our calculated energy profiles for the reaction pathways show not only that formation of the [2+2] cycloaddition structure is kinetically favored because of its low-energy barrier, but also that, as temperature increases, the kinetically favored [2+2] cycloaddition structure is converted to the more thermodynamically stable end-bridge and dimer-bridge structures via an intermediate state where the O atom forms a dative bond to the down Si atom of the buckled dimer. In addition, we find that the Si-C bonding (antibonding) states of the [2+2] cycloaddition structure appear at about 1-2 (2-3) eV below (above) the Fermi level, in which injected holes (electrons) through the STM tip can be created (trapped) to give rise to a Si-C bond breakage. These results manifest that the kinetically controlled reaction of acetone on Si(001) is associated with the [2+2] cycloaddition structure, rather than the alpha-H cleavage structure proposed by a recent STM experiment.-
dc.language영어-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.titleFirst-principles study of thermal and electron-activated dissociation of acetone on Si(001)-
dc.typeArticle-
dc.contributor.affiliatedAuthorCho, Jun-Hyung-
dc.identifier.doi10.1063/1.3021075-
dc.identifier.scopusid2-s2.0-56849096534-
dc.identifier.wosid000261141300010-
dc.identifier.bibliographicCitationJOURNAL OF CHEMICAL PHYSICS, v.129, no.19, pp.1 - 6-
dc.relation.isPartOfJOURNAL OF CHEMICAL PHYSICS-
dc.citation.titleJOURNAL OF CHEMICAL PHYSICS-
dc.citation.volume129-
dc.citation.number19-
dc.citation.startPage1-
dc.citation.endPage6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryPhysics, Atomic, Molecular & Chemical-
dc.subject.keywordPlusSCANNING TUNNELING MICROSCOPE-
dc.subject.keywordPlusSILICON(001) SURFACE-
dc.subject.keywordPlusCYCLOADDITION REACTIONS-
dc.subject.keywordPlusSEMICONDUCTOR SURFACES-
dc.subject.keywordPlusSI(100)-(2X1) SURFACE-
dc.subject.keywordPlusORGANIC MONOLAYERS-
dc.subject.keywordPlusADSORPTION-
dc.subject.keywordPlusPSEUDOPOTENTIALS-
dc.subject.keywordPlusACETYLENE-
dc.subject.keywordPlusDECOMPOSITION-
dc.subject.keywordAuthoradsorption-
dc.subject.keywordAuthorannealing-
dc.subject.keywordAuthordensity functional theory-
dc.subject.keywordAuthordissociation-
dc.subject.keywordAuthorelemental semiconductors-
dc.subject.keywordAuthorFermi level-
dc.subject.keywordAuthororganic compounds-
dc.subject.keywordAuthorreaction kinetics theory-
dc.subject.keywordAuthorscanning electron microscopy-
dc.subject.keywordAuthorsilicon-
dc.subject.keywordAuthorsurface chemistry-
dc.subject.keywordAuthorthermal stability-
dc.subject.keywordAuthorthermochemistry-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/1.3021075-
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