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Current Flow Mechanisms of Platinum-Silicided p-Type Schottky Barrier MOSFETs

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dc.contributor.authorJang, Moongyu-
dc.contributor.authorLee, Seongjae-
dc.date.accessioned2022-12-21T01:06:59Z-
dc.date.available2022-12-21T01:06:59Z-
dc.date.created2022-08-26-
dc.date.issued2008-10-
dc.identifier.issn0374-4884-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177835-
dc.description.abstractThe current flow mechanisms of platinum-silicided p-type Schottky barrier metal-oxide-semiconductor field-effect-transistors (SB-MOSFETs) are analyzed by incorporating experimental results with an analytical model. In our analysis, we find that the off-current is mainly attributed to the thermionic current component whereas the on-current is due to the tunneling current. Since the tunneling current component rapidly increases at voltage above the threshold voltage, a lower Schottky barrier height and a thinner gate oxide are essential features to achieve a higher drive current in SB-MOSFETs.-
dc.language영어-
dc.language.isoen-
dc.publisherKOREAN PHYSICAL SOC-
dc.titleCurrent Flow Mechanisms of Platinum-Silicided p-Type Schottky Barrier MOSFETs-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Seongjae-
dc.identifier.doi10.3938/jkps.53.2175-
dc.identifier.scopusid2-s2.0-55949109364-
dc.identifier.wosid000260100400073-
dc.identifier.bibliographicCitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.53, no.4, pp.2175 - 2178-
dc.relation.isPartOfJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.titleJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.volume53-
dc.citation.number4-
dc.citation.startPage2175-
dc.citation.endPage2178-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.identifier.kciidART001472281-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Multidisciplinary-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlus2-DIMENSIONAL NUMERICAL-SIMULATION-
dc.subject.keywordAuthorSchottky barrier-
dc.subject.keywordAuthorMOSFET-
dc.subject.keywordAuthorTunneling-
dc.subject.keywordAuthorMechanism-
dc.identifier.urlhttps://www.jkps.or.kr/journal/view.html?volume=53&number=4&spage=2175&year=2008-
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