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Crystalline structure of ceria particles controlled by the oxygen partial pressure and STI CMP performances

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dc.contributor.authorKim, Ye-Hwan-
dc.contributor.authorKim, Sang-Kyun-
dc.contributor.authorKim, Namsoo-
dc.contributor.authorPark, Jea-Gun-
dc.contributor.authorPaik, Ungyu-
dc.date.accessioned2022-12-21T01:23:28Z-
dc.date.available2022-12-21T01:23:28Z-
dc.date.created2022-08-26-
dc.date.issued2008-09-
dc.identifier.issn0304-3991-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177956-
dc.description.abstractThe effect of the crystalline Structures of nano-sized ceria particles on shallow trench isolation (STI) chemical mechanical planarization (CMP) performance was investigated. The ceria particles were synthesized via a solid-state displacement reaction method, and their crystalline structure was controlled by regulating the oxygen Partial pressure at the reaction site on the precursor. The crystalline structures of ceria particles were analyzed by the high-resolution TEM nano-beam diffraction pattern. in a calcination process with a high oxygen concentration, the synthesized ceria particles had a cubic fluorite structure (CeO2), because of the decarbonation of the cerium precursor. However, a low oxygen concentration results in a hexagonal phase cerium oxide (Ce2O3) rather than the cubic phase Clue to the insufficient oxidation of Ce3+ to Ce4+. In the STI CMP evaluation, the ceria slurry prepared with the (sic) dCeO(2) shows enhanced performances of the oxide-to-nitride removal selectivity.-
dc.language영어-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.titleCrystalline structure of ceria particles controlled by the oxygen partial pressure and STI CMP performances-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Jea-Gun-
dc.contributor.affiliatedAuthorPaik, Ungyu-
dc.identifier.doi10.1016/j.ultramic.2008.04.079-
dc.identifier.scopusid2-s2.0-49949096164-
dc.identifier.wosid000259728000062-
dc.identifier.bibliographicCitationULTRAMICROSCOPY, v.108, no.10, pp.1292 - 1296-
dc.relation.isPartOfULTRAMICROSCOPY-
dc.citation.titleULTRAMICROSCOPY-
dc.citation.volume108-
dc.citation.number10-
dc.citation.startPage1292-
dc.citation.endPage1296-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMicroscopy-
dc.relation.journalWebOfScienceCategoryMicroscopy-
dc.subject.keywordPlusSHALLOW TRENCH ISOLATION-
dc.subject.keywordPlusCHEMICAL-MECHANICAL PLANARIZATION-
dc.subject.keywordPlusPHYSICAL-CHARACTERISTICS-
dc.subject.keywordPlusPOLISHING RATE-
dc.subject.keywordPlusSURFACTANT-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordPlusSLURRY-
dc.subject.keywordAuthorchemical mechanical planarization-
dc.subject.keywordAuthorceria-
dc.subject.keywordAuthorcrystalline structure-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0304399108001253?via%3Dihub-
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서울 공과대학 > 서울 에너지공학과 > 1. Journal Articles
서울 공과대학 > 서울 융합전자공학부 > 1. Journal Articles

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