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Design of pattern-specific mask grating for giving the effect of an off-axis illumination
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Young-Seok | - |
| dc.contributor.author | Song, Seok Ho | - |
| dc.contributor.author | Lee, Jong Ung | - |
| dc.contributor.author | Oh, Sung Hyun | - |
| dc.contributor.author | Choi, Yong Kyoo | - |
| dc.contributor.author | Kim, Munsik | - |
| dc.contributor.author | Rajiv, Beom-Hoan | - |
| dc.contributor.author | Park, Se-Geun | - |
| dc.contributor.author | Lee, El-Hang | - |
| dc.contributor.author | Lee, Seung Gol | - |
| dc.date.accessioned | 2022-12-21T03:06:37Z | - |
| dc.date.available | 2022-12-21T03:06:37Z | - |
| dc.date.issued | 2008-05 | - |
| dc.identifier.issn | 0277-786X | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/178637 | - |
| dc.description.abstract | In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves. | - |
| dc.format.extent | 10 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | SPIE | - |
| dc.title | Design of pattern-specific mask grating for giving the effect of an off-axis illumination | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1117/12.798809 | - |
| dc.identifier.scopusid | 2-s2.0-44949145164 | - |
| dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.6792, pp 1 - 10 | - |
| dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
| dc.citation.volume | 6792 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 10 | - |
| dc.type.docType | Conference Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | Architectural design | - |
| dc.subject.keywordPlus | Masks | - |
| dc.subject.keywordPlus | European | - |
| dc.subject.keywordPlus | In order | - |
| dc.subject.keywordPlus | mask patterning | - |
| dc.subject.keywordPlus | Off-axis-illumination (OAI) | - |
| dc.subject.keywordPlus | Pattern shape | - |
| dc.subject.keywordPlus | photo masking | - |
| dc.subject.keywordPlus | Photoacoustic effect | - |
| dc.subject.keywordAuthor | Dummy mask | - |
| dc.subject.keywordAuthor | Mask grating | - |
| dc.subject.keywordAuthor | Off-axis illumination | - |
| dc.subject.keywordAuthor | Optical lithography | - |
| dc.subject.keywordAuthor | Resolution enhancement | - |
| dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6792/1/Design-of-pattern-specific-mask-grating-for-giving-the-effect/10.1117/12.798809.short?SSO=1 | - |
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Related Researcher
- Song, Seok Ho
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)