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Effect of a buffer layer on microstructural evolution in ZnO/Si heterostructures

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dc.contributor.authorKim, Jun Ho-
dc.contributor.authorMoon, Jin-Young-
dc.contributor.authorLee, Herman Seong-
dc.contributor.authorKong, Bo Hyun-
dc.contributor.authorCho, Hyun-Kyong-
dc.contributor.authorJung, Eun Soo-
dc.contributor.authorKim, Hong Seung-
dc.contributor.authorKim, Tae Whan-
dc.date.accessioned2022-12-21T03:36:58Z-
dc.date.available2022-12-21T03:36:58Z-
dc.date.created2022-08-26-
dc.date.issued2008-04-
dc.identifier.issn0374-4884-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/178779-
dc.description.abstractWe have deposited ZnO thin films on Si(111) substrates with and without a low temperature-grown ZnO buffer layer by using radio-frequency (rf) magnetron sputtering. The microstructural properties of ZnO/Si heterostructures have been investigated by using X-ray diffraction (XRD), pole-figures and transmission electron microscopy (TEM) measurements. The results of XRD, pole figures and TEM showed that both ZnO thin films with and without an embedded buffer layer had highly c-axis preferred orientations. When low-temperature-grown ZnO was used as an embedded buffer layer, the crystal quality of the ZnO thin films was improved due to the reduced rotation of the c-axis, despite its smaller grain size.-
dc.language영어-
dc.language.isoen-
dc.publisherKOREAN PHYSICAL SOC-
dc.titleEffect of a buffer layer on microstructural evolution in ZnO/Si heterostructures-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Tae Whan-
dc.identifier.doi10.3938/jkps.52.1061-
dc.identifier.scopusid2-s2.0-43149119989-
dc.identifier.wosid000255004600015-
dc.identifier.bibliographicCitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.52, no.4, pp.1061 - 1064-
dc.relation.isPartOfJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.titleJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.volume52-
dc.citation.number4-
dc.citation.startPage1061-
dc.citation.endPage1064-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.identifier.kciidART001240990-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Multidisciplinary-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusLOW-TEMPERATURE GROWTH-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusEPITAXIAL-GROWTH-
dc.subject.keywordPlusSUBSTRATE-
dc.subject.keywordPlusTHICKNESS-
dc.subject.keywordPlusMOCVD-
dc.subject.keywordAuthorZnO-
dc.subject.keywordAuthorbuffer layer-
dc.subject.keywordAuthortransmission electron microscopy-
dc.subject.keywordAuthormicrostructure-
dc.identifier.urlhttps://www.jkps.or.kr/journal/view.html?volume=52&number=4&spage=1061&year=2008-
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