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Fabrication and gas sensing properties of vertically aligned Si nanowires

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dc.contributor.authorMirzaei, Ali-
dc.contributor.authorKang, Sung Yong-
dc.contributor.authorChoi, Sun-Woo-
dc.contributor.authorKwon, Yong Jung-
dc.contributor.authorChoi, Myung Sik-
dc.contributor.authorBang, Jae Hoon-
dc.contributor.authorKim, Sang Sub-
dc.contributor.authorKim, Hyoun Woo-
dc.date.accessioned2021-08-02T13:54:10Z-
dc.date.available2021-08-02T13:54:10Z-
dc.date.created2021-05-12-
dc.date.issued2018-01-
dc.identifier.issn0169-4332-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/17886-
dc.description.abstractIn this study, a peculiar configuration for a gas sensor consisting of vertically aligned silicon nanowires (VA-Si NWs) synthesized by metal-assisted chemical etching (MACE) is reported. Si NWs were prepared via a facile MACE method and subsequent thermal annealing. Etching was performed by generation of silver nanoparticles (Ag NPs) and subsequent etching in HF/H2O2 aqueous solution; the growth conditions were optimized by changing the process parameters. Highly vertically oriented arrays of Si NWs with a straight-line morphology were obtained, and a top-top electrode configuration was applied. The VA-Si NW gas sensor showed good sensing performance, and the VA-Si NWs exhibited a remarkable response (R-g/R-a = 11.5 similar to 17.1) to H-2 gas (10-50 ppm) at 100 degrees C which was the optimal working temperature. The formation mechanism and gas sensing mechanism of VA-Si NWs are described. The obtained results can suggest new approaches to making inexpensive, versatile, and portable sensors based on Si NWs having a novel top-top electrode structure that are fully compatible with well-developed Si technologies.-
dc.language영어-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.titleFabrication and gas sensing properties of vertically aligned Si nanowires-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Hyoun Woo-
dc.identifier.doi10.1016/j.apsusc.2017.08.182-
dc.identifier.scopusid2-s2.0-85028752714-
dc.identifier.wosid000415219100025-
dc.identifier.bibliographicCitationAPPLIED SURFACE SCIENCE, v.427, pp.215 - 226-
dc.relation.isPartOfAPPLIED SURFACE SCIENCE-
dc.citation.titleAPPLIED SURFACE SCIENCE-
dc.citation.volume427-
dc.citation.startPage215-
dc.citation.endPage226-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusPOROUS SILICON-
dc.subject.keywordPlusORDERED ARRAYS-
dc.subject.keywordPlusSNO2 NANOWIRES-
dc.subject.keywordPlusZNO NANORODS-
dc.subject.keywordPlusSENSOR-
dc.subject.keywordPlusNO2-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusCOMPOSITE-
dc.subject.keywordPlusMOLECULE-
dc.subject.keywordPlusMICROSTRUCTURE-
dc.subject.keywordAuthorSilicon-
dc.subject.keywordAuthorNanowires-
dc.subject.keywordAuthorChemical etching-
dc.subject.keywordAuthorGas sensors-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0169433217325588?via%3Dihub-
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