Fabrication and characteristics of TiO2 nanotubes using atomic layer chemical vapor deposition (ALCVD)

Abstract

In this study, we report fabrication of TiO2 nanotubes using atomic layer chemical vapor deposition (ALCVD). In addition, electrical properties of single TiO2 nanotube devices are presented. Comparative study on TiO2 nanotube devices is discussed. The electrical test devices are fabricated by a novel patterning route combining conventional photolithography and Focused Ion Beam (FIB) techniques as well as direct FIB patterning. Additionally, electrical characteristics of TiO2 nanotubes are measured by direct probing in TEM. TiO2 nanotube devices show linear I-V characteristics depending on ambient and technique of measurement.