Study on the electrical properties of direct-patternable SBT films formed by photochemical metal-organic deposition
DC Field | Value | Language |
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dc.contributor.author | Park, Hyeong-Ho | - |
dc.contributor.author | Chang, Ho Jung | - |
dc.contributor.author | Jeon, Hyeongtag | - |
dc.date.accessioned | 2022-12-21T09:29:22Z | - |
dc.date.available | 2022-12-21T09:29:22Z | - |
dc.date.created | 2022-09-16 | - |
dc.date.issued | 2007-01 | - |
dc.identifier.issn | 0255-5476 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180541 | - |
dc.description.abstract | The ferroelectric properties of UV irradiated and non-irradiated SBT thin films using photosensitive starting precursors were investigated. The observation of surface microstructure showed that UV irradiation and increase in anneal temperature induced the grain growth of SBT. The measured remnant polarization values of UV irradiated and non-irradiated SBT films after anneal at 700°C were 5.8 and 4.7 μC/cm2 and after anneal at 750°C, the values were 10.8 and 9.3 μC/cm2, respectively. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Trans Tech Publications Ltd | - |
dc.title | Study on the electrical properties of direct-patternable SBT films formed by photochemical metal-organic deposition | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Jeon, Hyeongtag | - |
dc.identifier.doi | 10.4028/www.scientific.net/MSF.544-545.1061 | - |
dc.identifier.scopusid | 2-s2.0-38349136258 | - |
dc.identifier.bibliographicCitation | Materials Science Forum, v.544-545, pp.1061 - 1064 | - |
dc.relation.isPartOf | Materials Science Forum | - |
dc.citation.title | Materials Science Forum | - |
dc.citation.volume | 544-545 | - |
dc.citation.startPage | 1061 | - |
dc.citation.endPage | 1064 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Annealing | - |
dc.subject.keywordPlus | Metallorganic chemical vapor deposition | - |
dc.subject.keywordPlus | Microstructure | - |
dc.subject.keywordPlus | Remanence | - |
dc.subject.keywordPlus | Thin films | - |
dc.subject.keywordPlus | Ultraviolet radiation | - |
dc.subject.keywordPlus | Direct-patterning | - |
dc.subject.keywordPlus | Photoresist-free | - |
dc.subject.keywordPlus | SBT films | - |
dc.subject.keywordPlus | Photochemical reactions | - |
dc.subject.keywordAuthor | Direct-patterning | - |
dc.subject.keywordAuthor | Photochemical reaction | - |
dc.subject.keywordAuthor | Photoresist-free | - |
dc.subject.keywordAuthor | SBT | - |
dc.subject.keywordAuthor | UV irradiation | - |
dc.identifier.url | https://www.scientific.net/MSF.544-545.1061 | - |
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