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Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ryu, Yeung-Shik | - |
| dc.contributor.author | Kang, Tae Won | - |
| dc.contributor.author | Kim, Taewhan | - |
| dc.date.accessioned | 2022-12-21T09:50:27Z | - |
| dc.date.available | 2022-12-21T09:50:27Z | - |
| dc.date.issued | 2006-12 | - |
| dc.identifier.issn | 0169-4332 | - |
| dc.identifier.issn | 1873-5584 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180728 | - |
| dc.description.abstract | Scanning electron microscopy (SEM), Fourier transform infrared (FTIR) transmission, and Hall effect measurements were performed to investigate the structural, optical, and electrical properties of as-grown and in situ-annealed Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers by using molecular beam epitaxy. After the Hg0.7Cd0.3Te epilayers had been annealed in a Hg-cell flux atmosphere, the SEM images showed that the surface morphologies of the Hg0.7Cd0.3Te thin films were mirror-like with no indication of pinholes or defects, and the FTIR spectra showed that the transmission intensities had increased in comparison to that of the as-grown Hg0.7Cd0.3Te epilayer. Hall-effect measurements showed that n-Hg0.7Cd0.3Te epilayers were converted to p-Hg0.7Cd0.3Te epilayers. These results indicate that the surface, optical, and electrical proper-ties of the Hg1-xCdxTe epilayers are improved by annealing and that as-grown n-Hg1-xCdxTe epilayers can be converted to p-Hg1-xCdxTe epilayers by in situ annealing. (c) 2006 Elsevier B.V. All rights reserved. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier BV | - |
| dc.title | Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.apsusc.2006.05.028 | - |
| dc.identifier.scopusid | 2-s2.0-33751531815 | - |
| dc.identifier.wosid | 000243244300047 | - |
| dc.identifier.bibliographicCitation | Applied Surface Science, v.253, no.5, pp 2652 - 2656 | - |
| dc.citation.title | Applied Surface Science | - |
| dc.citation.volume | 253 | - |
| dc.citation.number | 5 | - |
| dc.citation.startPage | 2652 | - |
| dc.citation.endPage | 2656 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.subject.keywordPlus | BEAM EPITAXIAL-GROWTH | - |
| dc.subject.keywordPlus | HGCDTE | - |
| dc.subject.keywordPlus | GAAS | - |
| dc.subject.keywordPlus | REDUCTION | - |
| dc.subject.keywordPlus | FILMS | - |
| dc.subject.keywordAuthor | thermal annealing effect | - |
| dc.subject.keywordAuthor | molecular beam epitaxy | - |
| dc.subject.keywordAuthor | optical properties | - |
| dc.subject.keywordAuthor | semiconductors | - |
| dc.subject.keywordAuthor | surface morphology | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0169433206007276?via%3Dihub | - |
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