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Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers

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dc.contributor.authorRyu, Yeung-Shik-
dc.contributor.authorKang, Tae Won-
dc.contributor.authorKim, Taewhan-
dc.date.accessioned2022-12-21T09:50:27Z-
dc.date.available2022-12-21T09:50:27Z-
dc.date.issued2006-12-
dc.identifier.issn0169-4332-
dc.identifier.issn1873-5584-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180728-
dc.description.abstractScanning electron microscopy (SEM), Fourier transform infrared (FTIR) transmission, and Hall effect measurements were performed to investigate the structural, optical, and electrical properties of as-grown and in situ-annealed Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers by using molecular beam epitaxy. After the Hg0.7Cd0.3Te epilayers had been annealed in a Hg-cell flux atmosphere, the SEM images showed that the surface morphologies of the Hg0.7Cd0.3Te thin films were mirror-like with no indication of pinholes or defects, and the FTIR spectra showed that the transmission intensities had increased in comparison to that of the as-grown Hg0.7Cd0.3Te epilayer. Hall-effect measurements showed that n-Hg0.7Cd0.3Te epilayers were converted to p-Hg0.7Cd0.3Te epilayers. These results indicate that the surface, optical, and electrical proper-ties of the Hg1-xCdxTe epilayers are improved by annealing and that as-grown n-Hg1-xCdxTe epilayers can be converted to p-Hg1-xCdxTe epilayers by in situ annealing. (c) 2006 Elsevier B.V. All rights reserved.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherElsevier BV-
dc.titleEffects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.apsusc.2006.05.028-
dc.identifier.scopusid2-s2.0-33751531815-
dc.identifier.wosid000243244300047-
dc.identifier.bibliographicCitationApplied Surface Science, v.253, no.5, pp 2652 - 2656-
dc.citation.titleApplied Surface Science-
dc.citation.volume253-
dc.citation.number5-
dc.citation.startPage2652-
dc.citation.endPage2656-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusBEAM EPITAXIAL-GROWTH-
dc.subject.keywordPlusHGCDTE-
dc.subject.keywordPlusGAAS-
dc.subject.keywordPlusREDUCTION-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorthermal annealing effect-
dc.subject.keywordAuthormolecular beam epitaxy-
dc.subject.keywordAuthoroptical properties-
dc.subject.keywordAuthorsemiconductors-
dc.subject.keywordAuthorsurface morphology-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0169433206007276?via%3Dihub-
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