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Band-gap opening in metallic carbon nanotubes adsorbed on H/Si(001)

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dc.contributor.authorLee, Jung-Yup-
dc.contributor.authorCho, Jun-Hyung-
dc.date.accessioned2022-12-21T11:00:12Z-
dc.date.available2022-12-21T11:00:12Z-
dc.date.issued2006-07-
dc.identifier.issn0003-6951-
dc.identifier.issn1077-3118-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/181279-
dc.description.abstractA recent scanning tunneling microscope nanolithography technique can fabricate one-dimensional "dangling-bond (DB) wire" by the selective removal of H atoms from a H-passivated Si(001) surface along the Si dimer row. We here theoretically investigate the bonding geometry, band structure, and.binding mechanism of an armchair (3,3) single-walled carbon nanotube (CNT) adsorbed on the DB wire. We find that the formation of C-Si bonds between the CNT and the DB wire gives rise to hybridization between the carbon pi-bond states and the Si dangling-bond states. This hybridization breaks the rotational symmetry of the (3,3) CNT whose pi-bonding and pi-antibonding bands cross at the Fermi level. As a result, the adsorbed CNT opens an energy gap of similar to 0.1 eV, yielding a metal-to-semiconductor transition.-
dc.language영어-
dc.language.isoENG-
dc.publisherAmerican Institute of Physics-
dc.titleBand-gap opening in metallic carbon nanotubes adsorbed on H/Si(001)-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1063/1.2221909-
dc.identifier.scopusid2-s2.0-33749644750-
dc.identifier.wosid000239793100105-
dc.identifier.bibliographicCitationApplied Physics Letters, v.89, no.2-
dc.citation.titleApplied Physics Letters-
dc.citation.volume89-
dc.citation.number2-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusPSEUDOPOTENTIALS-
dc.subject.keywordPlusSURFACES-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/1.2221909-
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