Analysis of repetitive pulse discharge system for plasma source ion implantation
DC Field | Value | Language |
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dc.contributor.author | Chung, Kyoung-Jae | - |
dc.contributor.author | Choe, Jae-Myeong | - |
dc.contributor.author | Hwang, Hui-Don | - |
dc.contributor.author | Kim, Gon Ho | - |
dc.contributor.author | Ko, Kwang Cheol | - |
dc.contributor.author | Hwang, Yong Seok | - |
dc.date.accessioned | 2022-12-21T11:19:49Z | - |
dc.date.available | 2022-12-21T11:19:49Z | - |
dc.date.created | 2022-09-16 | - |
dc.date.issued | 2006-05 | - |
dc.identifier.issn | 1076-8467 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/181475 | - |
dc.description.abstract | The analysis of the repetitive pulse discharge system for the plasma source ion implantation is investigated with both circuit simulation and experiment. In the circuit model, the ion and electron currents on a target are self-consistently varied with the applied voltage because the waveforms of repetitive pulse are affected by the internal properties of plasma, as well as the external circuit parameters. The circuit simulation reveals that not only the plasma properties, but also the circuit components, are important for pulse system to operate at high repetition-rate. The experiments are conducted with a plane electrode immersed in rf-driven argon plasmas. When negative high-voltage pulses are applied to the electrode, the current and voltage waveforms are measured and compared with the simulation results. Control parameters for high repetition-rate operation are discussed, based on the self-consistent circuit analysis of the pulse system. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IEEE | - |
dc.title | Analysis of repetitive pulse discharge system for plasma source ion implantation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ko, Kwang Cheol | - |
dc.identifier.doi | 10.1109/MODSYM.2006.365250 | - |
dc.identifier.scopusid | 2-s2.0-48349144559 | - |
dc.identifier.bibliographicCitation | Conference Record of the International Power Modulator Symposium and High Voltage Workshop, pp.329 - 332 | - |
dc.relation.isPartOf | Conference Record of the International Power Modulator Symposium and High Voltage Workshop | - |
dc.citation.title | Conference Record of the International Power Modulator Symposium and High Voltage Workshop | - |
dc.citation.startPage | 329 | - |
dc.citation.endPage | 332 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Argon | - |
dc.subject.keywordPlus | Circuit simulation | - |
dc.subject.keywordPlus | Control system analysis | - |
dc.subject.keywordPlus | Control theory | - |
dc.subject.keywordPlus | DC generators | - |
dc.subject.keywordPlus | Discharge (fluid mechanics) | - |
dc.subject.keywordPlus | Electric discharges | - |
dc.subject.keywordPlus | Electrolysis | - |
dc.subject.keywordPlus | Experiments | - |
dc.subject.keywordPlus | Fluid mechanics | - |
dc.subject.keywordPlus | Inert gases | - |
dc.subject.keywordPlus | Ion bombardment | - |
dc.subject.keywordPlus | Ion implantation | - |
dc.subject.keywordPlus | Ions | - |
dc.subject.keywordPlus | Metallizing | - |
dc.subject.keywordPlus | Military data processing | - |
dc.subject.keywordPlus | Modulation | - |
dc.subject.keywordPlus | Parameter estimation | - |
dc.subject.keywordPlus | Plasma sources | - |
dc.subject.keywordPlus | Plasmas | - |
dc.subject.keywordPlus | A plane | - |
dc.subject.keywordPlus | Applied voltages | - |
dc.subject.keywordPlus | Argon plasmas | - |
dc.subject.keywordPlus | Circuit analysis | - |
dc.subject.keywordPlus | Circuit components | - |
dc.subject.keywordPlus | Circuit modeling | - |
dc.subject.keywordPlus | Circuit parameters | - |
dc.subject.keywordPlus | Control parameters | - |
dc.subject.keywordPlus | Electron currents | - |
dc.subject.keywordPlus | High repetition | - |
dc.subject.keywordPlus | High voltage pulse (HV) | - |
dc.subject.keywordPlus | High-voltage (HV) | - |
dc.subject.keywordPlus | International (CO) | - |
dc.subject.keywordPlus | Plasma properties | - |
dc.subject.keywordPlus | Plasma source ion implantation (PSII) | - |
dc.subject.keywordPlus | Pulse discharging | - |
dc.subject.keywordPlus | Pulse systems | - |
dc.subject.keywordPlus | Simulation results | - |
dc.subject.keywordPlus | Voltage waveforms | - |
dc.subject.keywordPlus | Waveforms | - |
dc.subject.keywordPlus | Electric network analysis | - |
dc.identifier.url | https://ieeexplore.ieee.org/document/4216202 | - |
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