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The incident angle effect of al adatom on the growth morphology of Al/Ni(001) system: Molecular dynamics simulation
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Soon-gun | - |
| dc.contributor.author | Chung, Yong Chae | - |
| dc.date.accessioned | 2022-12-21T11:20:10Z | - |
| dc.date.available | 2022-12-21T11:20:10Z | - |
| dc.date.created | 2022-09-16 | - |
| dc.date.issued | 2006-05 | - |
| dc.identifier.issn | 0000-0000 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/181479 | - |
| dc.description.abstract | The deposition behavior of Al atoms on Ni(001) substrate for various adatom incident angle and incident energy is investigated in this study using molecular dynamics simulation to investigate the growth morphology and the quality of thin film in atomic level. Results show that the surface roughness is comparatively decreased irrespective of adatom incident angle at the incident energy of 6 eV. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | IEEE | - |
| dc.title | The incident angle effect of al adatom on the growth morphology of Al/Ni(001) system: Molecular dynamics simulation | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Chung, Yong Chae | - |
| dc.identifier.doi | 10.1109/INTMAG.2006.375667 | - |
| dc.identifier.scopusid | 2-s2.0-50249098566 | - |
| dc.identifier.bibliographicCitation | INTERMAG 2006 - IEEE International Magnetics Conference, pp.167 - 167 | - |
| dc.relation.isPartOf | INTERMAG 2006 - IEEE International Magnetics Conference | - |
| dc.citation.title | INTERMAG 2006 - IEEE International Magnetics Conference | - |
| dc.citation.startPage | 167 | - |
| dc.citation.endPage | 167 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Conference Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | Surface morphology | - |
| dc.subject.keywordPlus | Rough surfaces | - |
| dc.subject.keywordPlus | Surface roughness | - |
| dc.subject.keywordPlus | Atomic layer deposition | - |
| dc.subject.keywordPlus | Substrates | - |
| dc.subject.keywordPlus | Acceleration | - |
| dc.subject.keywordPlus | Atomic measurements | - |
| dc.subject.keywordPlus | Sputtering | - |
| dc.subject.keywordPlus | Ceramics | - |
| dc.subject.keywordPlus | Power engineering and energy | - |
| dc.identifier.url | https://ieeexplore.ieee.org/document/4261601 | - |
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Related Researcher
- Chung, Yong Chae
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)