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Low-power driven broadband phototransistor with a PbS/IGO/HfO2 stack

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dc.contributor.authorXu, Hongwei-
dc.contributor.author한희성-
dc.contributor.author허재석-
dc.contributor.author김민재-
dc.contributor.author최철희-
dc.contributor.author김태규-
dc.contributor.authorChang, Joon-Hyuk-
dc.contributor.authorJeong, Jae Kyeong-
dc.date.accessioned2023-02-21T05:29:32Z-
dc.date.available2023-02-21T05:29:32Z-
dc.date.issued2023-01-
dc.identifier.issn2050-7526-
dc.identifier.issn2050-7534-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/182330-
dc.description.abstractBroadband phototransistors have attracted considerable attention for numerous applications. Transistors based on amorphous oxide semiconductors (AOSs) provide an excellent photosensor platform because of the reasonably high mobility, extremely low off-state current, low-cost fabrication capability, and large-area scalability of AOSs. To create photo-responsivity for visible to near-infrared (NIR) light in an AOS transistor, lead sulfide quantum dots (PbS QDs) with a cutoff wavelength of 1300 nm were incorporated using a spin-coating process. The distance between PbS QDs was tailored by short tetrabutylammonium iodide ligands through a ligand exchange process. To reduce the operation voltage of the AOS phototransistor, indium gallium oxide (IGO) and hafnium oxide (HfO2) films were used as the semiconducting n-type channel and gate insulator, respectively. The IGO and HfO2 films were grown by plasma-enhanced atomic layer deposition (PEALD). The fabricated PbS QD/IGO phototransistors with an HfO2 gate insulator exhibited remarkable switching properties, such as a high carrier mobility of 20.1 cm(2) (V-1 s(-1)), a low subthreshold gate swing of 0.060 V decade(-1), and a high I-ON/OFF ratio of 2.2 x 10(8). Additionally, they also exhibited a photo-responsivity of 211 A W-1 and a detectivity of 8.9 x 10(11) Jones at 1300 nm even at an ultralow power operation (V-GS = +/- 1 V, V-DS = 0.1 V). Moreover, the fabricated devices showed a reasonable uniformity with near-zero V-TH in different batches and exhibited the modest degradation after the storage of 15 days to air atmosphere even though they were not encapsulated by a suitable passivation layer. The relevant physical rationale is discussed based on structural, optical, and electrical analyses. The results suggest that a phototransistor with a PbS QD/IGO/HfO2 stack can provide large-area scalable and low-voltage operation routes for visible to NIR imaging, communication, and sensing applications.-
dc.format.extent10-
dc.language영어-
dc.language.isoENG-
dc.publisherRoyal Society of Chemistry-
dc.titleLow-power driven broadband phototransistor with a PbS/IGO/HfO2 stack-
dc.typeArticle-
dc.publisher.location영국-
dc.identifier.doi10.1039/d2tc04056e-
dc.identifier.scopusid2-s2.0-85146322822-
dc.identifier.wosid000912078500001-
dc.identifier.bibliographicCitationJournal of Materials Chemistry C, v.11, no.4, pp 1569 - 1578-
dc.citation.titleJournal of Materials Chemistry C-
dc.citation.volume11-
dc.citation.number4-
dc.citation.startPage1569-
dc.citation.endPage1578-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusTHIN-FILM-TRANSISTOR-
dc.subject.keywordPlusATOMIC LAYER DEPOSITION-
dc.subject.keywordPlusDOT SOLAR-CELLS-
dc.subject.keywordPlusOXIDE SEMICONDUCTORS-
dc.subject.keywordPlusHIGH-RESPONSIVITY-
dc.subject.keywordPlusLOW-VOLTAGE-
dc.subject.keywordPlusPHOTODETECTORS-
dc.subject.keywordPlusHETEROJUNCTION-
dc.subject.keywordPlusCHANNEL-
dc.identifier.urlhttps://pubs.rsc.org/en/content/articlelanding/2023/TC/D2TC04056E-
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