Carbon Nanotubes as Etching Masks for the Formation of Polymer Nanostructures
DC Field | Value | Language |
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dc.contributor.author | Yim, Woongbin | - |
dc.contributor.author | Park, Sae June | - |
dc.contributor.author | Han, Sung Yong | - |
dc.contributor.author | Park, Yong Hyun | - |
dc.contributor.author | Lee, Sang Woon | - |
dc.contributor.author | Park, Hui Joon | - |
dc.contributor.author | Ahn, Yeong Hwan | - |
dc.contributor.author | Lee, Soonil | - |
dc.contributor.author | Park, Ji-Yong | - |
dc.date.accessioned | 2021-08-02T14:25:59Z | - |
dc.date.available | 2021-08-02T14:25:59Z | - |
dc.date.created | 2021-05-14 | - |
dc.date.issued | 2017-12 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/18537 | - |
dc.description.abstract | We investigate the interaction of carbon nanotubes (CNTs) embedded in a polymer matrix [poly(methyl methacrylate) (PMMA)] with Ar plasma, which results in the formation of PMMA nanostructures, as CNTs act as an etching mask. Because of the large differences in the Ar ion sputtering yields between CNTs and PMMA, PMMA lines with the width comparable to that of CNTs and as, high as 20 nm (for single-walled CNTs) or 80 nm (for multiwalled CNTs) can be obtained after repeated exposure of CNT/PMMA films to Ar plasma. We also follow the etching process by investigating changes in the IV characteristics and Raman spectra of CNTs after each exposure to Ar plasma, which shows progressive defect generations in CNTs while they maintain structural integrity long enough to act as the etching mask for PMMA underneath. We demonstrate that the PMMA nanotructure patterns can be transferred to a different polymer substrate using nanoimprinting. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Carbon Nanotubes as Etching Masks for the Formation of Polymer Nanostructures | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Hui Joon | - |
dc.identifier.doi | 10.1021/acsami.7b18035 | - |
dc.identifier.scopusid | 2-s2.0-85038563233 | - |
dc.identifier.wosid | 000418783700074 | - |
dc.identifier.bibliographicCitation | ACS APPLIED MATERIALS INTERFACES, v.9, no.50, pp.44053 - 44059 | - |
dc.relation.isPartOf | ACS APPLIED MATERIALS INTERFACES | - |
dc.citation.title | ACS APPLIED MATERIALS INTERFACES | - |
dc.citation.volume | 9 | - |
dc.citation.number | 50 | - |
dc.citation.startPage | 44053 | - |
dc.citation.endPage | 44059 | - |
dc.type.rims | ART | - |
dc.type.docType | 정기학술지(Article(Perspective Article포함)) | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | ION IRRADIATION | - |
dc.subject.keywordPlus | NANOWIRE LITHOGRAPHY | - |
dc.subject.keywordPlus | LARGE-SCALE | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | BOMBARDMENT | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | carbon nanotube | - |
dc.subject.keywordAuthor | plasma | - |
dc.subject.keywordAuthor | sputtering | - |
dc.subject.keywordAuthor | polymer | - |
dc.subject.keywordAuthor | nanostructure | - |
dc.identifier.url | https://pubs.acs.org/doi/10.1021/acsami.7b18035 | - |
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