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Design and Simulation of a Microwave Plasma Enhanced Chemical Vapor Deposition System Using Multiphysics Fluid Modeling

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dc.contributor.authorMing-Chieh Lin-
dc.date.accessioned2023-11-14T09:16:53Z-
dc.date.available2023-11-14T09:16:53Z-
dc.date.created2023-11-04-
dc.date.issued2023-10-31-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/192586-
dc.publisherThe American Physical Society (APS)-
dc.titleDesign and Simulation of a Microwave Plasma Enhanced Chemical Vapor Deposition System Using Multiphysics Fluid Modeling-
dc.typeConference-
dc.contributor.affiliatedAuthorMing-Chieh Lin-
dc.identifier.bibliographicCitationThe 65th Annual Meeting of the APS Division of Plasma Physics-
dc.relation.isPartOfThe 65th Annual Meeting of the APS Division of Plasma Physics-
dc.citation.titleThe 65th Annual Meeting of the APS Division of Plasma Physics-
dc.citation.conferencePlaceDenver, CO, USA-
dc.type.rimsCONF-
dc.description.journalClass1-
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