Cited 1 time in
Selective Dirac voltage engineering of individual graphene field-effect transistors for digital inverter and frequency multiplier integrations
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Sul, Onejae | - |
| dc.contributor.author | Kim, Kyumin | - |
| dc.contributor.author | Jung, Yungwoo | - |
| dc.contributor.author | Choi, Eunsuk | - |
| dc.contributor.author | Lee, Seung-Beck | - |
| dc.date.accessioned | 2021-08-02T14:51:34Z | - |
| dc.date.available | 2021-08-02T14:51:34Z | - |
| dc.date.issued | 2017-09 | - |
| dc.identifier.issn | 0957-4484 | - |
| dc.identifier.issn | 1361-6528 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/19437 | - |
| dc.description.abstract | The ambipolar band structure of graphene presents unique opportunities for novel electronic device applications. A cycle of gate voltage sweep in a conventional graphene transistor produces a frequency-doubled output current. To increase the frequency further, we used various graphene doping control techniques to produce Dirac voltage engineered graphene channels. The various surface treatments and substrate conditions produced differently doped graphene channels that were integrated on a single substrate and multiple Dirac voltages were observed by applying a single gate voltage sweep. We applied the Dirac voltage engineering techniques to graphene field-effect transistors on a single chip for the fabrication of a frequency multiplier and a logic inverter demonstrating analog and digital circuit application possibilities. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Physics Publishing | - |
| dc.title | Selective Dirac voltage engineering of individual graphene field-effect transistors for digital inverter and frequency multiplier integrations | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.1088/1361-6528/aa8335 | - |
| dc.identifier.scopusid | 2-s2.0-85028449253 | - |
| dc.identifier.wosid | 000408167800001 | - |
| dc.identifier.bibliographicCitation | Nanotechnology, v.28, no.37 | - |
| dc.citation.title | Nanotechnology | - |
| dc.citation.volume | 28 | - |
| dc.citation.number | 37 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordAuthor | graphene | - |
| dc.subject.keywordAuthor | transistor | - |
| dc.subject.keywordAuthor | thermal anneal | - |
| dc.subject.keywordAuthor | boron nitride | - |
| dc.subject.keywordAuthor | photoresist | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.1088/1361-6528/aa8335 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
