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Thermal analysis of implanter source head in radio-frequency inductively coupled plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jeong, Chang-Won | - |
| dc.contributor.author | Ryu, Choong-Mo | - |
| dc.contributor.author | Lee, Hee-Lak | - |
| dc.contributor.author | Hwang, Jong Jin | - |
| dc.contributor.author | Moon, Seung Jae | - |
| dc.date.accessioned | 2024-11-28T09:31:20Z | - |
| dc.date.available | 2024-11-28T09:31:20Z | - |
| dc.date.issued | 2024-03 | - |
| dc.identifier.issn | 1071-1023 | - |
| dc.identifier.issn | 2166-2746 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/196039 | - |
| dc.description.abstract | The inductively coupled plasma-ion implanter is a closed vacuum, and the temperature increase in the source head owing to plasma generation in the chamber was predicted by numerical simulation and verified via measurements. The heat generation of the source head inside the vacuum chamber was photographed using an infrared thermal-imaging camera and set as the main temperature boundary condition for analysis. The showerhead temperature was confirmed through thermocouple measurements to verify the simulation and ensure reliability. An error of less than 1% was obtained for the aperture and aperture cover. The simulation-analysis results and measured showerhead results obtained from the thermocouple equipment exhibited an error of less than 2%. | - |
| dc.format.extent | 10 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | American Institute of Physics | - |
| dc.title | Thermal analysis of implanter source head in radio-frequency inductively coupled plasma | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1116/6.0003060 | - |
| dc.identifier.scopusid | 2-s2.0-85183961037 | - |
| dc.identifier.wosid | 001153935800001 | - |
| dc.identifier.bibliographicCitation | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.42, no.2, pp 1 - 10 | - |
| dc.citation.title | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | - |
| dc.citation.volume | 42 | - |
| dc.citation.number | 2 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 10 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | EMISSIVITY | - |
| dc.identifier.url | https://pubs.aip.org/avs/jvb/article/42/2/024001/3253557/Thermal-analysis-of-implanter-source-head-in-radio | - |
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