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A Novel 3D Gate-All-Around Vertical FeFET with Back-Gate Structure for Disturbance-Less Program Operation

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dc.contributor.authorKu, Boncheol-
dc.contributor.authorSim, Jae-Min-
dc.contributor.authorHur, Jae Seok-
dc.contributor.authorJeong, Jae Kyeong-
dc.contributor.authorSong, Yun-Heub-
dc.contributor.authorChoi, Changhwan-
dc.date.accessioned2024-11-28T16:31:33Z-
dc.date.available2024-11-28T16:31:33Z-
dc.date.issued2024-05-
dc.identifier.issn0000-0000-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/197721-
dc.description.abstractWe demonstrated 3D vertical Gate-All-Around (GAA) vertical-channel FeFET using ferroelectric (FE) Zr-doped HfO2 (HZO) and indium-gallium oxide (IGO) channel. Subthreshold swing of 90 mV/dec, large memory window (MW) of 2.5V, 2 bits/cell, and reliable 10-years retention are reported. Furthermore, new Gate-All-Around with Back-Gate (GAAB) structure and operation scheme are proposed to increase MW by improving the channel potential controllability and enhance resistance against disturb for Multi-Level Cell(MLC) operation.-
dc.format.extent4-
dc.language영어-
dc.language.isoENG-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.titleA Novel 3D Gate-All-Around Vertical FeFET with Back-Gate Structure for Disturbance-Less Program Operation-
dc.typeArticle-
dc.identifier.doi10.1109/IMW59701.2024.10536939-
dc.identifier.scopusid2-s2.0-85195403172-
dc.identifier.wosid001233896700004-
dc.identifier.bibliographicCitation2024 IEEE International Memory Workshop, IMW 2024 - Proceedings, pp 1 - 4-
dc.citation.title2024 IEEE International Memory Workshop, IMW 2024 - Proceedings-
dc.citation.startPage1-
dc.citation.endPage4-
dc.type.docTypeProceedings Paper-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaComputer Science-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryComputer Science, Hardware & Architecture-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusHafnium oxides-
dc.subject.keywordPlusIndium compounds-
dc.subject.keywordPlusZirconium compounds-
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서울 공과대학 > 서울 융합전자공학부 > 1. Journal Articles
서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles

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