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수직분자선 구조의 다층분자막 EUV 포토레지스트 소재 개발
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2024-12-02T15:00:45Z | - |
| dc.date.available | 2024-12-02T15:00:45Z | - |
| dc.date.issued | 2023-08-22 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/199268 | - |
| dc.title | 수직분자선 구조의 다층분자막 EUV 포토레지스트 소재 개발 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2023 차세대 리소그래피 학술대회 | - |
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