Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Hybrid Multilayer EUV Dry Photoresist for 1.5 nm Technology Node
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2024-12-16T14:30:47Z | - |
| dc.date.available | 2024-12-16T14:30:47Z | - |
| dc.date.issued | 2024-01-26 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/202192 | - |
| dc.title | Hybrid Multilayer EUV Dry Photoresist for 1.5 nm Technology Node | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 31th Korean Conference on Semiconductors | - |
| dc.citation.conferencePlace | 경주 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 자연과학대학 > 서울 화학과 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Sung, Myung Mo
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF CHEMISTRY)