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Design and Modeling of a Microwave Plasma Enhanced Chemical Vapour Deposition System for Growth of Diamond Films
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ming-Chieh Lin | - |
| dc.date.accessioned | 2025-01-09T09:30:25Z | - |
| dc.date.available | 2025-01-09T09:30:25Z | - |
| dc.date.issued | 2024-06-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/205325 | - |
| dc.title | Design and Modeling of a Microwave Plasma Enhanced Chemical Vapour Deposition System for Growth of Diamond Films | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 51st IEEE International Conference on Plasma Science (ICOPS) | - |
| dc.citation.conferencePlace | Beijing, China | - |
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Lin, Ming Chieh
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)