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Plasma Enhanced Atomic Layer Deposition of HfO2 with Applying DC Bias
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2025-07-18T23:00:20Z | - |
| dc.date.available | 2025-07-18T23:00:20Z | - |
| dc.date.issued | 2025-06-24 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/208292 | - |
| dc.title | Plasma Enhanced Atomic Layer Deposition of HfO2 with Applying DC Bias | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | ALD/ALE 2025 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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