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Nanostructure Engineering by Oblique Angle Deposition for Photodetectors and Other Applications

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dc.contributor.authorLee, Gyeongho-
dc.contributor.authorKo, Raksan-
dc.contributor.authorKang, Seungme-
dc.contributor.authorKim, Yeong Jae-
dc.contributor.authorKim, Young-Joon-
dc.contributor.authorYoo, Hocheon-
dc.date.accessioned2025-09-25T07:00:09Z-
dc.date.available2025-09-25T07:00:09Z-
dc.date.issued2025-07-
dc.identifier.issn2072-666X-
dc.identifier.issn2072-666X-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/208828-
dc.description.abstractOblique angle deposition (OAD) holds significant potential for diverse applications, including energy harvesting devices, optoelectronic sensors, and electronic devices, owing to the creation of unique nanostructures. These nanostructures are characterized by their porosity and nanoscale columns, which can exist in numerous forms depending on deposition conditions. As a result, the engineering of nanostructures using OAD achieves the successful modulation of optical properties such as absorption, reflection, and transmission. This explains the current surge of attention toward photodetectors based on OAD technology. This review presents various photodetectors based on OAD technology and summarizes reported cases. It also explores current advancements, major applications, and future directions in photodetector development and nanostructure engineering. Ultimately, this review aims to provide a comprehensive overview of the research trends in photodetectors utilizing OAD technology and focus on their further development and application potential.-
dc.format.extent26-
dc.language영어-
dc.language.isoENG-
dc.publisherMultidisciplinary Digital Publishing Institute (MDPI)-
dc.titleNanostructure Engineering by Oblique Angle Deposition for Photodetectors and Other Applications-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.3390/mi16080865-
dc.identifier.scopusid2-s2.0-105014272517-
dc.identifier.wosid001558078200001-
dc.identifier.bibliographicCitationMicromachines, v.16, no.8, pp 1 - 26-
dc.citation.titleMicromachines-
dc.citation.volume16-
dc.citation.number8-
dc.citation.startPage1-
dc.citation.endPage26-
dc.type.docTypeReview-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaInstruments & Instrumentation-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Analytical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryInstruments & Instrumentation-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusREACTIVE BALLISTIC DEPOSITION-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusREFRACTIVE-INDEX-
dc.subject.keywordPlusNANOROD ARRAYS-
dc.subject.keywordPlusSOLAR-CELLS-
dc.subject.keywordPlusELECTRON-TRANSPORT-
dc.subject.keywordPlusOPTICAL-PROPERTIES-
dc.subject.keywordPlusBROAD-BAND-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusANTIREFLECTION-
dc.subject.keywordAuthoroblique angle deposition-
dc.subject.keywordAuthornanostructure-
dc.subject.keywordAuthorphotodetectors-
dc.identifier.urlhttps://www.mdpi.com/2072-666X/16/8/865-
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