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Tailoring Magnetic Skyrmion Dimensions via Precise Interface Roughness Modulation in W-Inserted Skyrmion SOT Channel Grown on β-Phase W Seed Layer

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dc.contributor.authorChoi, Yohan-
dc.contributor.authorKim, Sang-Min-
dc.contributor.authorYeo, Heonhwan-
dc.contributor.authorShin, Yeonsoo-
dc.contributor.authorKim, Min-cheol-
dc.contributor.authorKim, Jae-Kyeong-
dc.contributor.authorShim, Tae-Hun-
dc.contributor.authorPark, Jin-Sub-
dc.contributor.authorPark, Jea-Gun-
dc.date.accessioned2026-05-04T02:30:18Z-
dc.date.available2026-05-04T02:30:18Z-
dc.date.issued2026-04-
dc.identifier.issn2199-160X-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/212486-
dc.description.abstractFor skyrmion-based perpendicular (p) Spin-Orbit-Torque (SOT) magnetic random-access-memory (MRAM), a tungsten (W)-inserted skyrmion SOT channel was designed by a precise modulation of the W insert layer thickness (tw,insert) having 0.100-0.142 nm as well as the interface roughness (Ra,interf,sky) having 18.13-33.73 pixel density (a.u.) between ferromagnet Co2Fe6B2 free layer and MgO tunneling barrier. An inverse relation was found between Ra,interf,sky and tw,insert; i.e., a higher Ra,interf,sky required a smaller tw,insert. In addition, Ra,interf,sky is critically determined by the surface roughness (Ra,surf,seed) of the beta-phase SOT seed layer having 0.120-0.138 nm. A higher Ra,surf,seed induced significantly a higher Ra,interf,sky. Particularly, a precise design of the skyrmion diameter (0.96-0.62 & micro;m) and density (0.093-0.140 ea/& micro;m2) found that a higher Ra,interf,sky led to a smaller skyrmion diameter and a higher skyrmion density. These results demonstrate a practical possibility of a skyrmion-based SOT MRAM via a new inserted material and its related precise modulation of Ra,interf,sky.-
dc.format.extent14-
dc.language영어-
dc.language.isoENG-
dc.publisherWILEY-
dc.titleTailoring Magnetic Skyrmion Dimensions via Precise Interface Roughness Modulation in W-Inserted Skyrmion SOT Channel Grown on β-Phase W Seed Layer-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1002/aelm.202500775-
dc.identifier.scopusid2-s2.0-105035629521-
dc.identifier.wosid001738156500001-
dc.identifier.bibliographicCitationADVANCED ELECTRONIC MATERIALS, v.12, no.8, pp 1 - 14-
dc.citation.titleADVANCED ELECTRONIC MATERIALS-
dc.citation.volume12-
dc.citation.number8-
dc.citation.startPage1-
dc.citation.endPage14-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusDYNAMICS-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthormagnetic random-access-memory-
dc.subject.keywordAuthormagnetic skyrmions-
dc.subject.keywordAuthorperpendicular magnetic anisotropy-
dc.subject.keywordAuthorsurface roughness-
dc.identifier.urlhttps://advanced.onlinelibrary.wiley.com/doi/10.1002/aelm.202500775-
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