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Polystyrene/Ceria Core/Shell Abrasive Based Slurry for Highly Enhanced Oxide-film Polishing Rate and Scratch-less in Chemical Mechanical Planarization
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박재근 | - |
| dc.date.accessioned | 2021-08-02T18:36:00Z | - |
| dc.date.available | 2021-08-02T18:36:00Z | - |
| dc.date.issued | 2018-10-03 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/26308 | - |
| dc.title | Polystyrene/Ceria Core/Shell Abrasive Based Slurry for Highly Enhanced Oxide-film Polishing Rate and Scratch-less in Chemical Mechanical Planarization | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2018 AiMES | - |
| dc.citation.conferencePlace | Moon Palace Resort, Cancun | - |
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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