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Film Characteristics of low-k SiOC deposited by Atomic Layer Deposition
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-02T22:51:38Z | - |
| dc.date.available | 2021-08-02T22:51:38Z | - |
| dc.date.issued | 2017-11-16 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/30095 | - |
| dc.title | Film Characteristics of low-k SiOC deposited by Atomic Layer Deposition | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2017년도 한국재료학회 추계학술대회 | - |
| dc.citation.conferencePlace | 경주 현대호텔 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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