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Effect of Substrate and Damaged Layter Thickness to Residual Stress and Bow of Free-standing Gallium Nitride Wafers during Wafering Process

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dc.contributor.author박재근-
dc.date.accessioned2021-08-03T00:27:56Z-
dc.date.available2021-08-03T00:27:56Z-
dc.date.issued2017-10-03-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/31191-
dc.titleEffect of Substrate and Damaged Layter Thickness to Residual Stress and Bow of Free-standing Gallium Nitride Wafers during Wafering Process-
dc.typeConference-
dc.citation.conferenceName232nd ECS Meeting-
dc.citation.conferencePlaceGaylord National Resort & Convention Center-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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