Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y₂O₃ and YF₃ Coatings under NF₃ Plasma
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Song, Je-Boem | - |
dc.contributor.author | Kim, Jin-Tae | - |
dc.contributor.author | Oh, Seong-Geun | - |
dc.contributor.author | Yun, Ju-Young | - |
dc.date.accessioned | 2021-08-03T02:57:28Z | - |
dc.date.available | 2021-08-03T02:57:28Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2019-02 | - |
dc.identifier.issn | 2079-6412 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/32905 | - |
dc.description.abstract | Yttrium oxide (Y2O3) and yttrium oxyfluoride (YO0.6F2.1) protective coatings were prepared by an atmospheric plasma spraying technique. The coatings were exposed to a NF3 plasma. After the NF3 plasma treatment, the mass loss of the coatings showed that the etching rate of YO0.6F2.1 was larger than that of the Y2O3. X-ray photoelectron spectroscopy revealed that YO0.5F1.9 was present in the Y2O3 coating, whereas YO0.4F2.2 was present in the YO0.6F2.1 coating. Transmission electron microscope analysis conducted on contamination particles generated during the plasma etching showed that both coatings were mainly composed of YFx. The contamination particles estimated by in-situ particle monitoring sensor revealed that the YO0.6F2.1 compared with the Y2O3 coatings produced 65% fewer contamination particles. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | MDPI | - |
dc.title | Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y₂O₃ and YF₃ Coatings under NF₃ Plasma | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Oh, Seong-Geun | - |
dc.identifier.doi | 10.3390/coatings9020102 | - |
dc.identifier.scopusid | 2-s2.0-85065791606 | - |
dc.identifier.wosid | 000460700700040 | - |
dc.identifier.bibliographicCitation | COATINGS, v.9, no.2, pp.1 - 8 | - |
dc.relation.isPartOf | COATINGS | - |
dc.citation.title | COATINGS | - |
dc.citation.volume | 9 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | Y | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | ALUMINUM-OXIDE | - |
dc.subject.keywordPlus | SUSPENSION | - |
dc.subject.keywordPlus | FILM | - |
dc.subject.keywordAuthor | yttrium oxide (Y2O3) | - |
dc.subject.keywordAuthor | yttrium oxyfluoride (YOF) | - |
dc.subject.keywordAuthor | yttrium fluoride (YF3) | - |
dc.subject.keywordAuthor | atmospheric plasma spraying (APS) | - |
dc.subject.keywordAuthor | contamination particle | - |
dc.subject.keywordAuthor | plasma etching | - |
dc.subject.keywordAuthor | NF3 plasma | - |
dc.identifier.url | https://www.mdpi.com/2079-6412/9/2/102 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.