Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
A Compact Hollow-Anode Discharge Source for Sputtering Processes
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정규선 | - |
| dc.date.accessioned | 2021-08-03T06:07:04Z | - |
| dc.date.available | 2021-08-03T06:07:04Z | - |
| dc.date.created | 2021-06-30 | - |
| dc.date.issued | 2016-09-28 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/35396 | - |
| dc.publisher | 한국재료학회 | - |
| dc.title | A Compact Hollow-Anode Discharge Source for Sputtering Processes | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 정규선 | - |
| dc.identifier.bibliographicCitation | The 6th International Conference on Microelectronics and Plasma Technology | - |
| dc.relation.isPartOf | The 6th International Conference on Microelectronics and Plasma Technology | - |
| dc.citation.title | The 6th International Conference on Microelectronics and Plasma Technology | - |
| dc.citation.conferencePlace | Dream Center, Gyeongju, in Korea | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.