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Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-03T06:46:59Z | - |
| dc.date.available | 2021-08-03T06:46:59Z | - |
| dc.date.issued | 2015-12-07 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/37750 | - |
| dc.title | Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 4th Nano Today Conference | - |
| dc.citation.conferencePlace | JWMarriott Hotel, Dubai | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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