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Enhancement of electric characteristics of the SONOS memory devices with additional high-k structures in the floating gate

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dc.contributor.author김태환-
dc.date.accessioned2021-08-03T07:26:43Z-
dc.date.available2021-08-03T07:26:43Z-
dc.date.created2021-06-30-
dc.date.issued2015-07-01-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/39710-
dc.publisher나노기술연구협의회, 나노융합산업연구조합-
dc.titleEnhancement of electric characteristics of the SONOS memory devices with additional high-k structures in the floating gate-
dc.typeConference-
dc.contributor.affiliatedAuthor김태환-
dc.identifier.bibliographicCitationThe 13th International Nanotech Symposium & Nano-Convergence Expo, NANO KOREA(2015)-
dc.relation.isPartOfThe 13th International Nanotech Symposium & Nano-Convergence Expo, NANO KOREA(2015)-
dc.citation.titleThe 13th International Nanotech Symposium & Nano-Convergence Expo, NANO KOREA(2015)-
dc.citation.conferencePlaceCoex, Seoul, Korea-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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