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Design and Development of a Hollow-Anode Discharge Source for Sputtering Process

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dc.contributor.author정규선-
dc.date.accessioned2021-08-03T08:20:09Z-
dc.date.available2021-08-03T08:20:09Z-
dc.date.created2021-06-30-
dc.date.issued2014-12-11-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/41542-
dc.publisherThe Korean Physical Society-
dc.titleDesign and Development of a Hollow-Anode Discharge Source for Sputtering Process-
dc.typeConference-
dc.contributor.affiliatedAuthor정규선-
dc.identifier.bibliographicCitationThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.relation.isPartOfThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.titleThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.conferencePlace제주도/대한민국-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 (서울 전기공학전공)
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