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Multilevel characteristics and operating mechanisms of nonvolatile memory devices fabricated utilizing graphene oxide floating gate and polystyrene organic insulator

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dc.contributor.author김태환-
dc.date.accessioned2021-08-03T08:20:23Z-
dc.date.available2021-08-03T08:20:23Z-
dc.date.created2021-06-30-
dc.date.issued2014-12-07-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/41571-
dc.publisherThe Semiconductor Physics Division, The Korean Physical Society-
dc.titleMultilevel characteristics and operating mechanisms of nonvolatile memory devices fabricated utilizing graphene oxide floating gate and polystyrene organic insulator-
dc.typeConference-
dc.contributor.affiliatedAuthor김태환-
dc.identifier.bibliographicCitationThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.relation.isPartOfThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.titleThe 17th International Symposium on the Physics of Semiconductors and Applications-
dc.citation.conferencePlaceRamada Plaza Jeju Hotel, Jeju, Korea-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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