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Electrical Characteristics of the Multi Bit Flash Memories Fabricated Utilizing FinFET Structure Dependent on an Asymmetrical Series of Selective Doping Profiles

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dc.contributor.author김태환-
dc.date.accessioned2021-08-03T08:47:40Z-
dc.date.available2021-08-03T08:47:40Z-
dc.date.created2021-06-30-
dc.date.issued2014-11-06-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/42171-
dc.publisherGwangju-Jeonnam Nanotechnology Union-
dc.titleElectrical Characteristics of the Multi Bit Flash Memories Fabricated Utilizing FinFET Structure Dependent on an Asymmetrical Series of Selective Doping Profiles-
dc.typeConference-
dc.contributor.affiliatedAuthor김태환-
dc.identifier.bibliographicCitationThe 12th International Conference on Nano Science and Nano Technology-
dc.relation.isPartOfThe 12th International Conference on Nano Science and Nano Technology-
dc.citation.titleThe 12th International Conference on Nano Science and Nano Technology-
dc.citation.conferencePlaceMokpo National University & Shangria Beach Hotel, Korea-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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