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Deposition characterization of Al2O3 thin films by novel method of Atomic Layer Deposition
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2021-08-03T09:34:30Z | - |
| dc.date.available | 2021-08-03T09:34:30Z | - |
| dc.date.created | 2021-06-30 | - |
| dc.date.issued | 2014-08-18 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/43415 | - |
| dc.publisher | Korea Nano Technology Research Society | - |
| dc.title | Deposition characterization of Al2O3 thin films by novel method of Atomic Layer Deposition | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 성명모 | - |
| dc.identifier.bibliographicCitation | Nano Korea 2014 | - |
| dc.relation.isPartOf | Nano Korea 2014 | - |
| dc.citation.title | Nano Korea 2014 | - |
| dc.citation.conferencePlace | 서울 COEX | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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Collections - 서울 자연과학대학 > 서울 화학과 > 2. Conference Papers
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Related Researcher
- Sung, Myung Mo
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF CHEMISTRY)