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Characteristics of Low Temperature Al2O3 Encapsulation for Organic devices by Remote Plasma Atomic Layer Deposition
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-03T10:18:47Z | - |
| dc.date.available | 2021-08-03T10:18:47Z | - |
| dc.date.issued | 2014-05-15 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/44357 | - |
| dc.title | Characteristics of Low Temperature Al2O3 Encapsulation for Organic devices by Remote Plasma Atomic Layer Deposition | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2014년도 한국재료학회 춘계학술발표대회 | - |
| dc.citation.conferencePlace | 창원컨벤션센터 | - |
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