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Effect of NH3 Plasma Treatments on Deposition of Nickel Film by Chemical Vapor Deposition
- Authors
- 전형탁
- Issue Date
- 26-Feb-2014
- Place
- 한양대학교
- Conference Name
- 제21회 한국반도체학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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