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Role of H2O2 as oxidizer on the Ge-doped SbTe film for Chemical Mechanical polishing
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박재근 | - |
| dc.date.accessioned | 2021-08-03T13:47:22Z | - |
| dc.date.available | 2021-08-03T13:47:22Z | - |
| dc.date.issued | 2012-11-09 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/49666 | - |
| dc.title | Role of H2O2 as oxidizer on the Ge-doped SbTe film for Chemical Mechanical polishing | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국재료학회 2012년도 추계학술대회 | - |
| dc.citation.conferencePlace | 라카이 샌드파인 리조트 | - |
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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