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Band gap modulation of ZnTe thin films by oxygen and nitrogen ambient gases during magnetron sputtering

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dc.contributor.author김은규-
dc.date.accessioned2021-08-03T14:47:49Z-
dc.date.available2021-08-03T14:47:49Z-
dc.date.created2021-06-30-
dc.date.issued2012-07-06-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/51187-
dc.publisherICMAP 2012 Organizing Committee-
dc.titleBand gap modulation of ZnTe thin films by oxygen and nitrogen ambient gases during magnetron sputtering-
dc.typeConference-
dc.contributor.affiliatedAuthor김은규-
dc.identifier.bibliographicCitationInter. Conf. on Microelectron. and Plasma Tech. 2012 (ICMAP 2012)-
dc.relation.isPartOfInter. Conf. on Microelectron. and Plasma Tech. 2012 (ICMAP 2012)-
dc.citation.titleInter. Conf. on Microelectron. and Plasma Tech. 2012 (ICMAP 2012)-
dc.citation.conferencePlaceJeju, Korea-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 자연과학대학 > 서울 물리학과 > 2. Conference Papers

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